Harris helps
New technology to enable pathologists and other medical professionals to view, collaborate and rapidly manipulate multi-GB digital images in a virtual environment is being demonstrated publicly for the first time by Harris, says Fox Business.
It will be showcased at the Healthcare Information and Management Systems Society annual conference and exhibition, from 24 to 28 February, in Orlando, Florida.
The Harris imaging technology, originally designed for the US intelligence community and civilian agencies, enables a pathologist workflow in a digital and collaborative context. By accessing local or wide area networks, multiple pathologists can view, pan across and zoom into digital images as if they were looking through a microscope at the actual slides.
Rahman honoured by industry
Claflin University art professor Habibur Rahman has an eye and an appreciation for good design, and the quality of his own graphic design work is being recognised by the entire printing industry of North and South Carolina, states The Times and Democrat.
Rahman, associate professor and interim art department chairman, has earned a PICA Award of Excellence from the Printing Industry of the Carolinas for Orangeburg-based Sun Printing.
Sun received the award for his design of "A Claflin Homecoming: The Art of Leo Twiggs", an exhibition catalogue for the Arthur Rose Museum on the university campus.
Zeiss, Sematech unveil Prove
Engineers at Carl Zeiss SMT AG and the Sematech consortium have revealed a method of photomask registration and overlay suitable for double patterning lithography, reports EETimes.
The method, called Prove, developed by a team of more than 40 Carl Zeiss SMT engineers and supported by Sematech, ascertains the accuracy of mask pattern alignment and registration for photomasks for use at 32nm half-pitch and beyond. The project is expected to reach 32nm capability by the end of 2009.
Double patterning is a technology for enhancing feature density by using standard 193nm wavelength technology. The newly developed metrology technology also forms part of the infrastructure of extreme ultraviolet lithography.
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